VACT 2297 Thin Film Deposition
Thin film deposition refers to techniques used to deposit layers of material on a surface ranging in layer thickness of a few nanometers (1 x 10-9 m) up to a thickness of 1 micrometer (1x10-6 m). This course provides an overview of the methods and the embedded vacuum-based technologies used to realize various material deposition processes. Students set up and run processes such as vacuum evaporation and sputtering to create a thin film and then examine characteristics of the layer produced.
Cross Listed Courses
NANO 2297
Prerequisite
VACT 2293 or NANO 2293
Offered
Spring